Our Technologies
Prominent Technical Magazine Articles, Presentation, Publications and Patents
This selection of publications is of electronic and optical materials, their performance properties and thermodynamics.
Magazine Articles
- Rona Belford, "A New Slant on Strain", Web Exclusive featured Article, Semiconductor International Magazine, 1st Oct 2006.
- Rona Belford, "Smart mechanical strain techniques to improve device performance", featured Article, Semiconductor Manufacturing Magazine, Sep 2006.
- R E Belford featured in "Silicon Takes the Strain", IEE Review special report on Microelectronics Dec 2003.
Patents
- US Patent No. 6,514,836 B2 “Method of Producing Strained Microelectronic and/or Optical Integrated and Discrete Devices”, Rona E. Belford, Feb 2003.
- U.S. Patent, No. 6,455,397 B1, “Method of Producing Strained Microelectronic and/or Optical Integrated and Discrete Devices”, Rona E. Belford, Sept 2002.
- UK Patent GB 2 295 677 B, “A Method of Measuring the Concentration of Ions in a Solution”, R E Belford 1998.
- US Patent 5,725,754, “Method of Measuring the Concentration of Ions in Solution”, R E Belford, 1998.
- UK Patent GB 2 295 898 B "Solid State Blown Glass pH and Other Ion Sensor Systems", R E Belford and P C W Brehier, 1998.
Conference Presentations
- Sumant Sood and Rona Belford, "Strained silicon via plasma enhanced dCTE bonding", International Symposium on Semiconductor Wafer Bonding, Cancun Mexico, Oct/ Nov 2006.
- Rona Belford, Qing Xu, Sumant Sood, Antonio Acosta, Alan Thrift, Jordan Zell, Lloyd Bosworth, “Novel Process Combining SOI and Strained Circuitry", 2006 IEEE International SOI Conference, New York, poster presentation, Oct 2-5 2006.
- Sumant Sood and Rona Belford, "Surface Activation Using Remote Plasma for a New Wafer Bonding Route to Strained-Si", 209th Electrochemical Society Meeting Denver, May 2006.
- Rona Belford, "No Strain, No Gain", invited paper, IEEE International Electron Device Materials Colloquium, Orlando, Feb 2006.
- Rona E. Belford, Wei Zhao, Jim Potashnik, Qingmin Liu, and Alan Seabaugh, “Performance Augmented CMOS Using Back-End Uniaxial Strain” Device Research Conference, June 2002.
- Rona E Belford, “Strained Si Compliant Substrates”, invited paper, International Conference on Alternative Substrate Technology, Lake Tahoe Jan 2001.
Publications
- Rona Belford and Sumant Sood, "Surface activation using remote plasma for silicon to quartz wafer bonding", Microsystem Technologies: Vol. 15(3), 407 (2009).
- R. E. Belford, Q. Xu, A. Acosta, S. Sood and L. Lu "Anisotropic Mechanical Stress Route to Optimally Strained Metal Oxide Semiconductor Field Effect Transistors, Submitted to IEEE Trans 2007.
- R. E. Belford and S. Sood “Surface Activation Using Remote Plasma for Hydrophilic Bonding at Elevated Temperature”, Electrochemical and Solid-State Letters, Vol 10, (5) H145-H148, 2007.
- Sumant Sood and Rona Belford, "Strained silicon via plasma enhanced dCTE bonding”, ECS Transactions, Vol. 3 (6), 99-106, (2006).
- R. E. Belford, B. P. Guo, Q. Xu, S. Sood, A. A. Thrift, A. Teren, A. Acosta, L. A. Bosworth, and J. S. Zell ‘Strain enhanced p-type metal oxide semiconductor field effect transistors’. J. Appl. Phys. 100, 064903 (2006).
- Sumant Sood and Rona Belford, "Surface Activation Using Remote Plasma for a New Wafer Bonding Route to Strained-Si", ” ECS Transactions, Vol. 2 (4), 23-29, (2006).
- Becca M. Haugerud, Mustayeen, B. Nayeem, Ramkumar Krithivasan, Yuan Lu, Chendong Zhu, John D. Cressler, Rona E. Belford, Alvin J. Joseph, “The effects of mechanical planar biaxial strain in Si/SiGe HBT BiCMOS technology” Solid-State Electronics 49 pp 986–990 2005.
- B. M. Haugerud, L. A. Bosworth and R. E. Belford, “Elevated-Temperature Electrical Characteristics of Mechanically Strained-Si Devices” J. Appl. Phys. Vol. 95, No. 1 pp 2792-2796, Mar 2004.
- Wei Zhao, Jianli He, Rona Belford, Lars-Erik Wernersson, and Alan Seabaugh, "Partially-Depleted SOI MOSFETs Under Uniaxial Tensile Strain" IEEE Trans. Electron Devices, Vol. 51, No. 3, pp 317-323, March 2004.
- B. M. Haugerud, L. A. Bosworth and R. E. Belford, “Mechanically Induced Strain Enhancement of Metal Oxide Semiconductor Field Effect Transistors” J. Appl. Phys. Vol. 94, No.6 pp 4102-4107, 2003.
- Rona E. Belford, Wei Zhao; J. Potashnik,Qingmin Liu and Alan Seabaugh, "Performance-augmented CMOS using back-end uniaxial strain" Device Research Conference, 2002, 60th DRC. 24-26 June 2002, Conference Digest Page(s): 41 - 42.
- R E Belford, “Uniaxial, Tensile Strained-Si Devices”, J. Elect. Mat., Vol. 30, No.7, 2001.
- P C W Brehier and Rona E Belford, "Effects of Ion Migration and Electrolysis in Glass
- Electrode Fabrication" Anal. Proc. Vol. 32, pp 327-328, 1995.
- R E Belford and P C W Brehier, "Thick-Film Reference Electrodes for Solid State pH Measurement", Anal. Proc. Vol. 32, pp 323-326, 1995.
- S Jiang, J D Myers, D Rhonehouse, M J Myers, R E Belford and Scott Hamlin, "Laser and Thermal Performance of a New Erbium Doped Phosphate Laser Glass", SPIE, Vol. 2138, 1994.
- Jiang, J D Myers, R E Belford, et al. "Flashlamp Pumped Lasing of Ho:Germanium Oxide Glass at Room Temperature", Advanced Solid State Lasers, Tech. Dig., OSA, Washington DC, pp 329-331, 1994.